A recent study by MIT’s Project NANDA highlighted a sobering statistic: Roughly 95% of AI projects fail to deliver ...

Design-based patterning adds intelligence to model creation and modification. Engineers and designers are always looking for ways to squeeze the last drop of performance from their CAD systems. One ...

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

If you are searching for ways to expand your creativity when using the Midjourney AI art generator. You will be pleased to know that AI entity and YouTuber Thaeyne has created a new video providing ...

Michael White, director of product marketing, Calibre Physical Verification products, Mentor Graphics At the rate that new technology nodes keep racing by, it sure feels like we’re speeding down the ...

Litho-Etch-Litho-Etch (LELE) double pattern (DP) processing affects many aspects of the design flow at/below the 20 nm node level. This can be very disruptive for the custom designer, impacting basic ...

Designs with LogicBIST exhibit random pattern resistance because of the random nature of LBIST vectors, thus leading to low fault coverage. To handle this, we insert test points with the help of ...